Hydrogen in amorphous silicon

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Structural defects and hydrogen clustering in amorphous silicon

We have studied by small angle X-ray scattering the structural evolution on the atomic and nanoscale of hydrogenated amorphous silicon prepared both by ion implantation and by plasma-enhanced chemical vapor deposition and containing a similar H content. Results show that the initial structure of both samples is homogeneous on the nanoscale. Upon annealing, low-density features on the nanometer ...

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ژورنال

عنوان ژورنال: Nuclear Instruments and Methods

سال: 1981

ISSN: 0029-554X

DOI: 10.1016/0029-554x(81)90708-4